Technics PE II Planar Etch II Plasma Etcher Asher with 13.56 MHz Model 750 RF Plasma Generator.
The Technics PE-II is a plasma-induced etcher that can be used for photoresist ashing, surface cleaning, and surface treatment and/or etching of various materials. This is equipped with a RF energy power supply (13.56 MHz) and is used with process gas. The RF power is variable allowing the operator to tailor the plasma density to suit the etching requirements. The system is equipped with a heater and thermocouple to monitor the temperature. Power rating: 110 VAC, 20 Amps, 60 Hz