Drytek DRIE-100 Cassette Planar Plasma Wafer Etcher System
Uses chlorine- and fluorine-based chemistries for etching various Si, polysilicon, nitride, tungsten, tungsten silicide films.+ Low energy etching for minimal substrate damage. Excellent selectivity, e.g., 20:1 poly Si:SiO2 Laser interferometer for etch rate determination and end-point detection. Leybold-Heraeus D60A Trivac Rotary Vane Vacuum Pump w/Breaker Box available for unit Various Accessories & Wafer Holders Included Complete Manuals Included Leybold-Heraeus D60A Trivac Rotary Vane Vacuum Pump Available $1995 This item was pulled from a high end cellular equipment manufacturer and appears to be in good condition. It is sold as is for parts or repair value.