Description
Headway Research PWM32 Photo Resist Spinner Coater System Complete Model Number PWM32-PS-CB15 PS Motor Capable of Up to 10,000 rpm, for relatively light loads such as silicon wafers, small photomasks, etc. CB15 Bowl 15-inch I.D., reduced by a removable splash deflector (12.75-inch opening) to a maximum recommended substrate dimension of 12 inches Includes Instruction Manual for Photo-Resist Pump Model HDP98 Complete with schematics PWM32 Microprocessor Sequence Controller is capable of: Up to 9 steps in one recipe Memory for up to 10 user designed recipes User defined & set in each step: rpm, ramp (accel/decel), time, various I/O for accessory control (dispensers, exhaust control, lid/doors, etc. Speed can be manually adjusted while a recipe is running Operator can manually turn on the vacuum to the chuck, overriding AUTO control LCD interface for user input prompting and process display
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