Headway Research PWM32 Photo Resist Spinner Coater System
Complete Model Number PWM32-PS-CB15
PS Motor Capable of Up to 10,000 rpm, for relatively light loads such as silicon wafers, small photomasks, etc.
CB15 Bowl 15-inch I.D., reduced by a removable splash deflector (12.75-inch opening) to a maximum recommended substrate dimension of 12 inches
Includes Instruction Manual for Photo-Resist Pump Model HDP98 Complete with schematics
PWM32 Microprocessor Sequence Controller is capable of:
Up to 9 steps in one recipe
Memory for up to 10 user designed recipes
User defined & set in each step: rpm, ramp (accel/decel), time, various I/O for accessory control (dispensers, exhaust control, lid/doors, etc.
Speed can be manually adjusted while a recipe is running
Operator can manually turn on the vacuum to the chuck, overriding AUTO control
LCD interface for user input prompting and process display