High Vacuum Ion Beam Deposition Head Sputter Source PVD Thin Film Coating

High Vacuum Ion Beam Deposition Head Sputter Source PVD Thin Film Coating

This is an unbranded high-vacuum ion beam deposition head — also referred to as a sputter source or depositing head — used in physical vapor deposition (PVD) systems for thin film coating applications. The unit features a large arc-shaped aluminum alloy housing with a central circular mesh-covered aperture through which the ion beam or sputtered material is directed at a substrate. Multiple electrical feedthrough connectors and flexible stainless steel conduits exit the base, providing power, signal, and possibly gas or coolant connections to the vacuum system.

Specifications & What's Included

• Type: Ion beam deposition / sputter source head for high-vacuum PVD systems
• Housing: Aluminum alloy, arc/D-shaped profile with flat front face
• Central aperture: Circular, covered with fine stainless steel mesh screen; concentric aluminum flanges with bolt pattern for flange or chamber mounting
• Top fitting: Small brass or stainless port/fitting (gas inlet or sensor port)
• Feedthrough connectors: Multiple coaxial and bayonet-style electrical feedthroughs on lower connector bank
• Flexible conduits: Multiple stainless steel braided flexible conduits attached (power/signal leads)
• Manufacturer: No markings or brand identification visible on unit
• Includes: Unit with all attached connectors and conduits as shown in photos

Applications

Ion beam deposition heads and sputter sources are core components in physical vapor deposition (PVD) chambers used to deposit thin films — metallic, dielectric, or compound coatings — onto substrates such as silicon wafers, optical elements, glass, and precision parts. In a typical system, the source is mounted inside a high-vacuum chamber and directed at a target material; energetic ions sputter or vaporize target atoms, which then travel across the vacuum and condense as a thin film on the substrate. These heads are standard equipment in semiconductor fabrication, optical coating, hard-disk manufacturing, solar cell production, and research coating systems. The multiple feedthrough connectors allow the external power supply, gas flow controllers, and instrumentation to connect into the vacuum environment without compromising chamber integrity. This type of source is also found in ion-assisted deposition (IAD) configurations used in precision optics. Lab and R&D facilities, thin-film coating job shops, and semiconductor tool refurbishers are the typical buyers for surplus deposition heads of this type.