The PVD 1000 deposited films offer an impressive step coverage. The PVD 1000 system is available with single-or dual-process chambers. The PVD 1000 reactor is used in a variety of applications for film deposition on "III/V" materials, such as gallium arsenide, indium antimonide and other materials that cannot tolerate higher deposition temperatures.
|Product Name||Low Pressure CVD Reactor Photo-Enhanced|
|Condition Description||This item has been inspected and it is in good condition.|