Description
Edwards QDP-40 Dry Vacuum Pump is a four-stage, positive displacement rotary pump. These Dry Pumps are ideal for the corrosive enviroment of semiconductor processing. The applications range from light duty loadlock and sputtering to demanding processes including plasma etch, LPCVD, PECVD, and MOCVD.
General Specifications:
Power rating: 208 / 480 VAC, 3-Phase, 60 Hz Warm-Up Time: 15 min Motor Rating: 2.2 kW Inlet Connection: ISO40 Outlet Connection: NW40 Water Cooled Vacuum System Maximum Leak-Rate: 1 x 10- 5 mbar ls-1 (1 x 10-3 Pa ls-1) Exhaust System Maximum Leak-Rate: 1 x 10- 5 mbar ls-1 (1 x 10-3 Pa ls-1) Ambient Operating Temperature Range: 5
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General Specifications:
